Abstract: Chemical Mechanical Polishing (CMP) is a crucial process in integrated circuit manufacturing. To determine the material removal rate in this process, three different models were employed for ...

While weather might be fleeting, it can cause massive disruption – particularly when you’re in the aviation business. Not only can it result in delays, but it can also lead to enormous financial ...

Abstract: In recent years, non-contact biometric identification has garnered significant attention owing to its flexibility and its capacity to ensure privacy and confidentiality. Previous research ...

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