Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Unlock the full InfoQ experience by logging in! Stay updated with your favorite authors and topics, engage with content, and download exclusive resources. Vivek Yadav, an engineering manager from ...

Take advantage of pattern matching improvements in C# 8.0 to write code that is more readable, maintainable, and efficient Pattern matching is an excellent feature that was introduced in C# 7. You can ...

It’s no secret that a successful yield ramp directly impacts integrated circuit (IC) product cost and time-to-market. Tools and techniques that help companies ramp to volume faster, while also ...

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

Network intrusion detection and pattern matching techniques form a critical pillar in contemporary cybersecurity. These methods enable the identification of malicious activities by scrutinising ...

Take advantage of the new relational and logical patterns in C# 9.0 to make your code more readable, maintainable, and efficient. Pattern matching is a great feature first introduced in C# 7. You can ...