Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.
Tech Xplore on MSN
New semiconductor etching process achieves five-fold speed improvement
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication ...
The groundbreaking discovery could open new doors for other researchers working with delicate materials such as cell membranes. (Nanowerk News) Imagine drawing on something as delicate as a living ...
Some enzymes can chew through synthetic polymers. Researchers would like to harness this ability to etch channels, trenches, and holes into biocompatible materials as a way to fabricate drug delivery ...
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